The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2022
Filed:
Jun. 16, 2020
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Ki Yung Lee, Suwon-si, KR;
Seung Bae Lee, Hwaseong-si, KR;
Assignee:
Semes Co., Ltd., Chungcheongnam-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/306 (2006.01); B01J 4/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67069 (2013.01); H01L 21/30621 (2013.01); B01J 4/001 (2013.01);
Abstract
Provided are a process gas supply apparatus which supplies a process gas onto a wafer to etch an oxide layer by dividing an edge zone into a first zone and a second zone located outside the first zone and dividing the second zone into a plurality of sub-zones and a wafer treatment system including the process gas supply apparatus.