The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 08, 2022

Filed:

Nov. 30, 2017
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Yoichi Tokunaga, Kumamoto, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 3/04 (2006.01); B08B 3/08 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02087 (2013.01); B08B 3/041 (2013.01); B08B 3/08 (2013.01); H01L 21/67051 (2013.01); H01L 21/67248 (2013.01); H01L 21/68764 (2013.01); H01L 22/20 (2013.01);
Abstract

There is provided a substrate processing apparatus including: a rotatable holding part configured to rotate a substrate while holding the substrate; a liquid supply part configured to supply a processing liquid to a peripheral edge portion of the substrate held by the rotatable holding part; a sensor configured to detect a temperature distribution at the peripheral edge portion; and a controller configured to execute an operation of detecting a boundary portion between a region of the peripheral edge portion to which the processing liquid adheres and a region of the peripheral edge portion to which the processing liquid does not adhere, based on the temperature distribution.


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