The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2022
Filed:
Aug. 21, 2017
Asml Netherlands B.v., Veldhoven, NL;
Nitish Kumar, Eindhoven, NL;
Adrianus Johannes Hendrikus Schellekens, Liempde, NL;
Sietse Thijmen Van Der Post, Utrecht, NL;
Ferry Zijp, Nuenen, NL;
Willem Maria Julia Marcel Coene, Geldrop, NL;
Peter Danny Van Voorst, Nijmegen, NL;
Duygu Akbulut, Eindhoven, NL;
Sarathi Roy, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.