The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2022
Filed:
Jan. 03, 2019
Asml Netherlands B.v., Veldhoven, NL;
Joshua Mark Lukens, San Diego, CA (US);
Bob Rollinger, San Diego, CA (US);
Pooriya Beyhaghi, San Diego, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Provided is an apparatus for and method of controlling formation of droplets () used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source () includes a fluid exiting an nozzle () and a sub-system having an electro-actuatable element () producing a disturbance in the fluid (). The droplet source produces a stream () that breaks down into droplets that in turn coalesce into larger droplets as they progress towards the irradiation region. The electro-actuatable element is driven by a hybrid waveform that controls the droplet generation/coalescence process. Also disclosed is a method of determining the transfer function for the nozzle.