The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2022

Filed:

Jul. 11, 2020
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Kuo-Sheng Chuang, Hsinchu, TW;

You-Hua Chou, Hsinchu, TW;

Ming-Chi Huang, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01); H01L 27/088 (2006.01); H01L 29/165 (2006.01); H01L 29/10 (2006.01); H01L 29/51 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 21/28 (2006.01); H01L 21/8234 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01); H01L 21/311 (2006.01); H01L 29/78 (2006.01); H01L 29/08 (2006.01);
U.S. Cl.
CPC ...
H01L 29/408 (2013.01); H01L 21/02236 (2013.01); H01L 21/02255 (2013.01); H01L 21/28255 (2013.01); H01L 21/31138 (2013.01); H01L 21/6719 (2013.01); H01L 21/67109 (2013.01); H01L 21/67748 (2013.01); H01L 21/823462 (2013.01); H01L 27/088 (2013.01); H01L 29/1054 (2013.01); H01L 29/165 (2013.01); H01L 29/513 (2013.01); H01L 29/66545 (2013.01); H01L 29/0847 (2013.01); H01L 29/7833 (2013.01); H01L 29/7851 (2013.01);
Abstract

A transistor includes a silicon germanium layer, a gate stack, and source and drain features. The silicon germanium layer has a channel region. The silicon germanium layer has a first silicon-to-germanium ratio. The gate stack is disposed over the channel region of the silicon germanium layer and includes a silicon germanium oxide layer over and in contact with the channel region of the silicon germanium layer, a high-κ dielectric layer over the silicon germanium oxide layer, and a gate electrode over the high-κ dielectric layer. The silicon germanium oxide layer has a second silicon-to-germanium ratio, and the second silicon-to-germanium ratio is substantially the same as the first silicon-to-germanium ratio.


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