The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2022

Filed:

Apr. 11, 2019
Applicant:

Raytheon Company, Waltham, MA (US);

Inventors:

Jeffrey R. LaRoche, Austin, TX (US);

Kelly P. Ip, Lowell, MA (US);

Thomas E. Kazior, Sudbury, MA (US);

Kamal Tabatabaie Alavi, Methuen, MA (US);

Assignee:

RAYTHEON COMPANY, Waltham, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01); H01L 21/285 (2006.01); H01L 23/48 (2006.01); H01L 23/485 (2006.01); H01L 29/417 (2006.01); H01L 29/45 (2006.01); H01L 29/66 (2006.01); H01L 29/778 (2006.01); H01L 29/20 (2006.01); H01L 23/535 (2006.01); H01L 21/28 (2006.01); H01L 29/423 (2006.01); H01L 23/532 (2006.01); H01L 29/51 (2006.01);
U.S. Cl.
CPC ...
H01L 29/404 (2013.01); H01L 21/28575 (2013.01); H01L 23/481 (2013.01); H01L 23/485 (2013.01); H01L 23/535 (2013.01); H01L 29/2003 (2013.01); H01L 29/402 (2013.01); H01L 29/408 (2013.01); H01L 29/4175 (2013.01); H01L 29/41725 (2013.01); H01L 29/45 (2013.01); H01L 29/452 (2013.01); H01L 29/66462 (2013.01); H01L 29/7786 (2013.01); H01L 21/28114 (2013.01); H01L 21/28587 (2013.01); H01L 23/53238 (2013.01); H01L 29/42316 (2013.01); H01L 29/517 (2013.01); H01L 2229/00 (2013.01);
Abstract

A Field Effect Transistor (FET) structure having: a semiconductor; a first electrode structure; a second electrode structure; and a third electrode structure for controlling a flow of carriers in the semiconductor between the first electrode structure and the second electrode structure; a dielectric structure disposed over the semiconductor and extending horizontally between first electrode structure, the second electrode structure and the third electrode structure; and a fourth electrode passing into the dielectric structure and terminating a predetermined, finite distance above the semiconductor for controlling an electric field in the semiconductor under the fourth electrode structure.


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