The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2022
Filed:
Jan. 18, 2018
Applicant:
Asml Netherlands B.v., AH Veldhoven, NL;
Inventors:
Wei Fang, San Jose, CA (US);
Haili Zhang, San Jose, CA (US);
Zhichao Chen, San Jose, CA (US);
Shengcheng Jin, San Jose, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G03F 7/20 (2006.01); G05B 19/406 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G03F 7/7065 (2013.01); G05B 19/406 (2013.01); G05B 2219/32222 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A defect pattern grouping method is disclosed. The defect pattern grouping method comprises obtaining a first polygon that represents a first defect from an image of a sample, comparing the first polygon with a set of one or more representative polygons of a defect-pattern collection, and grouping the first polygon with any one or more representative polygons identified based on the comparison.