The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2022

Filed:

Nov. 06, 2018
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Zomer Silvester Houweling, Utrecht, NL;

Chaitanya Krishna Ande, Eindhoven, NL;

Dennis De Graaf, Waalre, NL;

Thijs Kater, Eindhoven, NL;

Michael Alfred Josephus Kuijken, Son en Breugel, NL;

Mahdiar Valefi, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/62 (2012.01);
U.S. Cl.
CPC ...
G03F 1/62 (2013.01);
Abstract

A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.


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