The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 25, 2022

Filed:

May. 10, 2019
Applicant:

Sumitomo Electric Industries, Ltd., Osaka, JP;

Inventor:

Hiromu Shiomi, Osaka, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 29/161 (2006.01); H01L 29/78 (2006.01); H01L 29/16 (2006.01); H01L 21/02 (2006.01); H01L 21/04 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1608 (2013.01); H01L 21/02378 (2013.01); H01L 21/0465 (2013.01);
Abstract

A silicon carbide substrate includes a first impurity region having a first conductivity type, a second impurity region having a second conductivity type, a third impurity region having the first conductivity type, and a fourth impurity region provided between a second main surface and a bottom surface and having the second conductivity type. The first impurity region has a first region being in contact with the second impurity region and having a first impurity concentration, a second region being continuous to the first region, provided between the first region and the second main surface, and having a second impurity concentration lower than the first impurity concentration, and a third region being continuous to the first region and having a third impurity concentration higher than the first impurity concentration. A side surface is in contact with the third region, the second impurity region, and the third impurity region.


Find Patent Forward Citations

Loading…