The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2022
Filed:
Jan. 14, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Gen Tamamushi, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 21/3065 (2006.01); H01J 37/32 (2006.01); B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); B08B 7/0035 (2013.01); H01J 37/3244 (2013.01); H01J 37/32651 (2013.01); H01J 37/32706 (2013.01); H01J 37/32724 (2013.01); H01L 21/30621 (2013.01); H01J 37/32091 (2013.01); H01J 2237/002 (2013.01); H01J 2237/334 (2013.01); H01J 2237/335 (2013.01);
Abstract
A method for controlling an electrostatic attractor, which attracts an electrode to a gas plate provided in an upper portion of a plasma processing apparatus, includes, among a plasma generation period in which plasma is generated by the plasma processing apparatus and an idle period in which no plasma is generated by the plasma processing apparatus, applying voltages having polarities different from each other to first and second electrodes of the electrostatic attractor in at least the idle period.