The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2022
Filed:
Sep. 27, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Paul Van Dongen, Eindhoven, NL;
Aart Adrianus Van Beuzekom, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 21/673 (2006.01); H01L 21/687 (2006.01); H01L 21/677 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70916 (2013.01); G03F 7/7075 (2013.01); G03F 7/70466 (2013.01); G03F 7/70475 (2013.01); G03F 7/70866 (2013.01); G03F 7/70991 (2013.01); H01L 21/67383 (2013.01); H01L 21/67389 (2013.01); H01L 21/67769 (2013.01); H01L 21/67778 (2013.01); H01L 21/68707 (2013.01); H01L 21/0275 (2013.01);
Abstract
A lithographic apparatus comprising a substrate storage module having a controllable environment for protecting lithographically exposed substrates from ambient air. The substrate storage module is configured to store at least twenty substrates and the substrate storage module is an integral part of the lithographic apparatus. The substrate storage module may be used to protect substrates from ambient air during stitched lithographic exposures.