The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2022
Filed:
Dec. 26, 2018
Applicant:
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Inventors:
Isao Hirano, Kanagawa, JP;
Takehiro Seshimo, Kanagawa, JP;
TseWei Yu, Kanagawa, JP;
YaChien Chuang, Kanagawa, JP;
Assignee:
TOKYO OHKA KOGYO CO., LTD., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/3213 (2006.01); C11D 11/00 (2006.01); H01L 21/311 (2006.01); C11D 7/50 (2006.01); C11D 7/08 (2006.01); H01L 21/027 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02068 (2013.01); C11D 7/08 (2013.01); C11D 7/5004 (2013.01); C11D 11/0047 (2013.01); H01L 21/0206 (2013.01); H01L 21/02082 (2013.01); H01L 21/31133 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01); H01L 21/0271 (2013.01); H01L 21/67138 (2013.01);
Abstract
A method includes contacting an organic cured film with an acidic cleaning liquid including sulfuric acid and a water-soluble organic solvent and does not include a compound capable of generating nitronium ions. An amount of the sulfuric acid in the acidic cleaning liquid is 40% by mass or more, and an amount of water in the acidic cleaning liquid is 5% by mass or less.