The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2022

Filed:

Feb. 05, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Qiwei Liang, Fremont, CA (US);

Rohit Sharma, Pune, IN;

Jingyu Qiao, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); C23C 16/452 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); C23C 16/45565 (2013.01); C23C 16/45591 (2013.01); H01J 37/32357 (2013.01); H01L 21/67069 (2013.01); C23C 16/452 (2013.01); C23C 16/45574 (2013.01); C23C 16/50 (2013.01); H01J 2237/002 (2013.01);
Abstract

Gas distribution assemblies are described including a first plate and a second plate. The first plate may define a plurality of first apertures, and the second plate may define a plurality of second apertures in a first region of the second plate and a plurality of third apertures in a second region of the second plate. The second apertures may align with the first apertures. An area defined by the second region may be less than an area defined by the first region. The second plate may be sealingly coupled with the first plate to define a volume between the first plate and the second plate. The volume may be fluidly accessible from the third apertures, and fluidly isolated from the first and second apertures.


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