The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2022

Filed:

Oct. 25, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Chi-Yu Lu, New Taipei, TW;

Hui-Zhong Zhuang, Kaohsiung, TW;

Li-Chun Tien, Tainan, TW;

Pin-Dai Sue, Tainan, TW;

Yi-Hsin Ko, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/392 (2020.01); G06F 30/398 (2020.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); G06F 30/398 (2020.01);
Abstract

A semiconductor device comprising at least one modified cell block that includes a modified abutment region in which is provided a first continuous active region arranged along a first axis parallel to a vertical abutment edge for positioning adjacent other cell blocks to form a vertical abutment, including non-standard, standard, and modified cell blocks. The structure provided within the modified abutment region improves a structural and device density match between the modified cell block and the adjacent cell block, thereby reducing the need for white space between vertically adjacent cell blocks and reducing the total device area and increasing cell density.


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