The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2022
Filed:
Oct. 18, 2019
Asml Netherlands B.v., Veldhoven, NL;
Marco Koert Stavenga, Eindhoven, NL;
Sergei Shulepov, Eindhoven, NL;
Koen Steffens, Veldhoven, NL;
Matheus Anna Karel Van Lierop, Eindhoven, NL;
Samuel Bertrand Dominique David, Tilburg, NL;
David Bessems, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.