The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2022
Filed:
Mar. 15, 2019
Jsr Corporation, Tokyo, JP;
Kazunori Takanashi, Tokyo, JP;
Hiroki Nakatsu, Tokyo, JP;
Kazunori Sakai, Tokyo, JP;
Ichihiro Miura, Tokyo, JP;
JSR CORPORATION, Tokyo, JP;
Abstract
A composition for resist underlayer film formation contains: a first compound including at least one oxazine structure fused to an aromatic ring; and a solvent. The first compound preferably includes a partial structure represented by formula (1). In formula (1), Rto Reach independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; Arrepresents a group obtained by removing (n+3) or (n+2) hydrogen atoms on the aromatic ring from an arene having 6 to 20 carbon atoms; Rrepresents a hydroxy group, a halogen atom, a nitro group or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 0 to 9.