The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2022
Filed:
Sep. 09, 2016
Massachusetts Institute of Technology, Cambridge, MA (US);
Samuel G. Rodriques, Cambridge, MA (US);
Daniel Oran, Cambridge, MA (US);
Ruixuan Gao, Cambridge, MA (US);
Shoh Asano, Cambridge, MA (US);
Mark A. Skylar-Scott, Brookline, MA (US);
Fei Chen, Cambridge, MA (US);
Paul W. Tillberg, Cambridge, MA (US);
Adam H. Marblestone, Medford, MA (US);
Edward S. Boyden, Chestnut Hill, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
The present invention enables three-dimensional nanofabrication by isotropic shrinking of patterned hydrogels. A hydrogel is first expanded, the rate of expansion being controlled by the concentration of the crosslinker. The hydrogel is then infused with a reactive group and patterned in three dimensions using a photon beam through a limited-diffraction microscope. Functional particles or materials are then deposited on the pattern. The hydrogel is then shrunk and cleaved from the pattern.