The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2021
Filed:
Jun. 15, 2020
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Minfeng Chen, Hsinchu, TW;
Shuo-Yen Chou, Hualien County, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 27/02 (2006.01); G03F 1/36 (2012.01); G03F 1/54 (2012.01); G03F 1/62 (2012.01);
U.S. Cl.
CPC ...
H01L 27/0207 (2013.01); G03F 1/36 (2013.01); G03F 1/54 (2013.01); G03F 1/62 (2013.01); G03F 7/2002 (2013.01); G03F 7/70125 (2013.01); G03F 7/70283 (2013.01); G03F 7/70441 (2013.01); G03F 7/70566 (2013.01); G03F 7/70958 (2013.01);
Abstract
A method includes providing a photomask having a patterned absorption layer over a substrate. The photomask is irradiated with a beam having a mixture of transverse electronic (TE) waves and transverse magnetic (TM) waves. The irradiating includes generating surface plasmonic polaritons (SPP) on a sidewall of the patterned absorption layer. The SPP is used to suppress the TM waves while reflecting the TE waves. A target substrate is exposed to TE waves.