logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11204551 B1

PDFFull Text
Date of Patent:
Dec. 21, 2021

Filed:

Jun. 23, 2017

Resist composition and method for forming resist pattern

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Masahito Yahagi, Kawasaki, JP;

Issei Suzuki, Kawasaki, JP;

Yuki Fukumura, Kawasaki, JP;

Toshikazu Takayama, Kawasaki, JP;

Takashi Kamizono, Kawasaki, JP;

Tatsuya Fujii, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01); G03F 7/039 (2006.01); C09D 125/18 (2006.01); C08F 12/24 (2006.01); C08F 212/14 (2006.01); C08F 220/26 (2006.01); C08L 51/08 (2006.01); C08L 53/00 (2006.01); C08L 67/04 (2006.01); C08L 87/00 (2006.01); C08F 220/58 (2006.01); C08F 220/38 (2006.01); C08F 220/40 (2006.01); C08F 220/30 (2006.01); C08F 220/28 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C08F 12/24 (2013.01); C08F 212/14 (2013.01); C08F 220/26 (2013.01); C08L 51/08 (2013.01); C08L 53/005 (2013.01); C08L 67/04 (2013.01); C08L 87/005 (2013.01); C09D 125/18 (2013.01); G03F 7/0046 (2013.01); G03F 7/0395 (2013.01); G03F 7/0397 (2013.01); C08F 220/281 (2020.02); C08F 220/282 (2020.02); C08F 220/283 (2020.02); C08F 220/30 (2013.01); C08F 220/301 (2020.02); C08F 220/302 (2020.02); C08F 220/303 (2020.02); C08F 220/38 (2013.01); C08F 220/40 (2013.01); C08F 220/58 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01);
Abstract

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group, Vais a divalent hydrocarbon group, nrepresents an integer of 0 to 2, Yais a carbon atom, Xais a group forming a monocyclic aliphatic hydrocarbon group together with Ya, and Rais an aromatic hydrocarbon group or a specific unsaturated hydrocarbon group. In general formula (b1), Rrepresents a cyclic hydrocarbon group, Yrepresents a divalent linking group containing an ester bond, Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond, and Mis an m-valent organic cation.

Find Patent Forward Citations

Loading…