The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 2021

Filed:

Jun. 25, 2018
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Tzung-Chen Wu, Hsinchu, TW;

Wen-Zhan Zhou, Zhubei, TW;

Heng-Jen Lee, Baoshan Township, TW;

Ho-Yung David Hwang, ChuPei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F27D 19/00 (2006.01); F27B 17/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
F27D 19/00 (2013.01); F27B 17/0025 (2013.01); H01L 21/67103 (2013.01); H01L 21/67248 (2013.01); H01L 21/67288 (2013.01); F27D 2019/0003 (2013.01); F27D 2019/0034 (2013.01); F27D 2019/0037 (2013.01);
Abstract

A method includes supporting a wafer on a heating element, wherein the heating element is located in a baking chamber. The method further includes heating the wafer for a first duration using the heating element. The method further includes measuring a temperature of the heating element and a temperature of the wafer during the first duration to obtain temperature information. The method further includes adjusting an amount of heat provided by the heating element during the first duration, wherein the adjusting of the amount of heat includes decreasing the amount of heat provided by the heating element as a rate of change of the temperature information versus time increases.


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