The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2021
Filed:
Dec. 27, 2019
Applicant:
Micron Technology, Inc., Boise, ID (US);
Inventors:
Song Guo, Boise, ID (US);
Sanh D. Tang, Meridian, ID (US);
Shen Hu, Boise, ID (US);
Yan Li, Boise, ID (US);
Nicholas R. Tapias, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C 11/24 (2006.01); H01L 27/108 (2006.01); G11C 11/408 (2006.01);
U.S. Cl.
CPC ...
H01L 27/10811 (2013.01); G11C 11/4087 (2013.01); H01L 27/1085 (2013.01); H01L 27/10885 (2013.01); H01L 27/10891 (2013.01);
Abstract
A method of forming an apparatus comprises forming pillar structures extending from a base material. Upper portions of the pillar structures may exhibit a lateral width that is relatively greater than a lateral width of lower portions of the pillar structures. The method also comprises forming access lines laterally adjacent to the lower portions of the pillar structures and forming digit lines above upper surfaces of the pillar structures. Memory devices and electronic systems are also described.