The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2021

Filed:

Jan. 31, 2020
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventor:

Hong Chen, San Ramon, CA (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/68 (2006.01); G06K 9/62 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
H01L 21/681 (2013.01); G06K 9/6203 (2013.01); G06T 7/001 (2013.01); G06K 2209/19 (2013.01); G06T 2207/20021 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A system includes a controller communicatively coupled to an optical inspection sub-system, the controller configured to: receive training images of a sample; identify alignment targets in the master die; receive a first set of reference images of a first die row of a sample, the first die row including a master die and a first set of reference die; align the first set of reference die to the master die via fine alignment processes to generate a first set of aligned reference images of the first row; receive a second set of reference images of a second die row of the sample; align the second set of reference die to the master die based on the alignment targets and the training images using a course alignment offset value; and align the second set of reference die to the master die via a fine alignment process.


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