The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 2021

Filed:

Nov. 12, 2020
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Kosuke Matsumoto, Tokyo, JP;

Takashi Nobuhara, Tokyo, JP;

Hirohiko Kitsuki, Tokyo, JP;

Kenji Obara, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/21 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/21 (2013.01); H01J 2237/216 (2013.01);
Abstract

The present disclosure provides a technique for reducing man-hour of a user required for setting an automatic focused focal point search function of an electron beam and facilitating observation of a sample when reviewing a defect using an electron microscope. The present disclosure provides a technique in a charged particle beam system, in which an appropriate focal point position search width can be automatically set in consideration of convergence accuracy and an operation time based on a focal point measure distribution width for a focal point position acquired in advance under the same conditions and a difference between focal point positions before and after automatic focused focal point position search.


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