The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 2021

Filed:

Mar. 09, 2020
Applicant:

Gigaphoton Inc., Tochigi, JP;

Inventors:

Koji Kakizaki, Oyama, JP;

Masakazu Kobayashi, Oyama, JP;

Akira Suwa, Oyama, JP;

Osamu Wakabayashi, Oyama, JP;

Assignee:

Gigaphoton Inc., Tochigi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01S 3/11 (2006.01); H01S 3/225 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70025 (2013.01); G03F 7/70041 (2013.01); G03F 7/70325 (2013.01); G03F 7/70333 (2013.01); G03F 7/70725 (2013.01); G03F 9/7026 (2013.01); H01S 3/11 (2013.01); H01S 3/2251 (2013.01);
Abstract

A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light by using a laser processing system includes: performing relative positioning of a transfer position of a transfer image and the transparent material in an optical axis direction of a pulse laser beam so that the transfer position is set at a position inside the transparent material at a predetermined depth ΔZsf from a surface of the transparent material in the optical axis direction; and irradiating the transparent material with the pulse laser beam having a pulse width of 1 ns to 100 ns inclusive and a beam diameter of 10 μm to 150 μm inclusive at the transfer position.


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