The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2021
Filed:
Nov. 21, 2016
Mitsubishi Materials Corporation, Tokyo, JP;
MITSUBISHI MATERIALS CORPORATION, Tokyo, JP;
Abstract
A polycrystalline diamond sintered material tool includes: a cemented carbide substrate, which is mainly composed of WC and includes Co; and a diamond layer containing a metal catalyst made of Co provided on the cemented carbide substrate. The average layer thickness of a Co rich layer formed in an interface between the cemented carbide substrate and the diamond layer is 30 μm or less. C/Cis 2 or less when Cis an average content of Co included in the diamond layer and Cis a peak value of a Co content in the Co rich layer. D/Dis less than 2 when D is an average grain size of WC particles in a region from the interface between the cemented carbide substrate and the diamond layer to 50 μm toward an inside of the cemented carbide substrate; and Dis an average grain size of WC particles.