The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2021
Filed:
Jan. 09, 2018
Kobus Sas, Montbonnot-Saint-Martin, FR;
Patrice Nal, Grenoble, FR;
Christophe Borean, Le Touvet, FR;
Other;
Abstract
Treatment chamber (C) for a chemical vapor deposition (CVD) reactor, comprising, within a body (B) defining an enclosure (E) under partial vacuum, a system () for injecting reactive species with a view to being deposited on a substrate () placed on a support element (), and a thermal control system () for regulating the temperature of the injection system () or keeping it substantially constant, this thermal control system () having an interface zone (ZI) with the injection system (). The treatment chamber (C) further comprises, in the interface zone (ZI), at least one thermal transfer zone (ZT) that is (i) insulated from the enclosure under partial vacuum (E) by an insulating barrier to the pressure and to the diffusion of contaminating species and (ii) filled with a thermal interface material (). Application for carrying out CVD depositions, especially pulsed CVD depositions.