The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2021
Filed:
Apr. 12, 2018
International Business Machines Corporation, Armonk, NY (US);
Dongbing Shao, Wappingers Falls, NY (US);
Lawrence A. Clevenger, Saratoga Springs, NY (US);
Shyng-Tsong Chen, Rensselaer, NY (US);
Hao Tang, Slingerlands, NY (US);
Jing Sha, White Plains, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
In accordance with an embodiment of the present invention, a photolithographic mask is provided. The photolithographic mask includes at least one merged via pattern in the photolithographic mask for printing a merged via opening in a resist layer, wherein the at least one merged via pattern includes a compound shape having a first rectangular opening portion and a second rectangular opening portion that intersect at an angle.