The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2021

Filed:

Jul. 21, 2020
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Takuya Umise, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67745 (2013.01); H01L 21/67173 (2013.01); H01L 21/67184 (2013.01); H01L 21/67196 (2013.01); H01L 21/67742 (2013.01);
Abstract

A substrate processing apparatus includes a transfer chamber row of transfer chambers arranged linearly, a processing chamber row of processing chambers arranged on one side or both sides of the transfer chamber row, a driving mechanism for rotating/extending/contracting a transfer arm of a substrate transfer mechanism in each transfer chamber, and a controller. A center of a substrate supporting region in the processing chamber is positioned closer to the transfer chamber row than a line connecting a rotation axis of the transfer arm and a center of a gate valve. Further, when loading and unloading a substrate between the processing chamber and the adjacent transfer chamber, the controller controls the driving mechanism such that a center of the substrate held by the transfer arm passes along an outer side of a line that connects a rotation axis of the transfer arm and a center of a substrate supporting region.


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