The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2021
Filed:
Sep. 18, 2020
Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;
Semiconductor Manufacturing International (Beijing) Corporation, Beijing, CN;
Zhang Pan, Shanghai, CN;
Ting Zhang, Shanghai, CN;
Abstract
A semiconductor structure and its fabrication method are provided in the present disclosure. The method includes providing a base substrate, forming a plurality of discrete core layers on the base substrate, forming an isolation layer on a top surface of a core layer, forming a sacrificial layer on the base substrate and exposing a top surface of the isolation layer, removing the isolation layer after forming the sacrificial layer, removing the sacrificial layer after removing the isolation layer, forming a mask layer on a sidewall surface of the core layer after removing the sacrificial layer, and removing the core layer after forming the mask layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile