The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2021
Filed:
Apr. 20, 2020
Tokyo Electron Limited, Tokyo, JP;
Hideaki Sato, Kumamoto, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate liquid processing method comprises: providing a substrate liquid processing apparatus that includes a processing liquid flow path including a concentration sensor and a heater configured to heat the processing liquid; measuring a period of time for which the processing liquid is retained in the part of the processing liquid flow path including the concentration sensor; when determined that the period of time measured by the timer is longer than a predetermined period of time, 1) heating the processing liquid to a temperature higher than a crystallization temperature at which a reaction between the processing liquid and the cleaning fluid resulting in crystallization occurs, 2) supplying at least a part of the heated processing liquid into the part of the processing liquid flow path including the concentration sensor; and supplying the cleaning fluid into the part of the processing liquid flow path including the concentration sensor.