The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2021
Filed:
Dec. 13, 2017
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); G03F 7/20 (2006.01); G05B 19/418 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); G03F 7/705 (2013.01); G03F 7/70666 (2013.01); G05B 19/41875 (2013.01); G06T 7/0006 (2013.01); G05B 2219/32189 (2013.01); G05B 2219/45031 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30121 (2013.01); G06T 2207/30148 (2013.01); H01L 22/12 (2013.01);
Abstract
A method where deviations of a characteristic of an image simulated by two different process models or deviations of the characteristic simulated by a process model and measured by a metrology tool, are used for various purposes such as to reduce the calibration time, improve the accuracy of the model, and improve the overall manufacturing process.
Cao, Yu. (2021). Methods of guiding process models and inspection in a manufacturing process (U.S. Patent No. 11183434). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11183434
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