The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2021
Filed:
May. 14, 2019
University of Florida Research Foundation, Inc., Gainesville, FL (US);
Gary W. Scheiffele, Gainesville, FL (US);
Edward L. Stanley, Gainesville, FL (US);
University of Florida Research Foundation, Inc., Gainesville, FL (US);
Abstract
Disclosed are methods for minimizing x-ray scattering artifacts, the method comprising: contacting an object with an x-ray scattering mitigation material. The contacting can comprise coating the x-ray scattering material on the object, including spraying a solution of suspension of an x-ray scattering mitigation material onto the object or dry powder coating the object with a x-ray scattering mitigation material. Alternatively, the contacting can comprise immersing the object in a fluid comprising the x-ray scattering material. The fluid can be a gas, a liquid, or a gel. The disclosed x-ray scattering mitigation material can be optimized for mitigating Compton radiation scattering or for mitigating Rayleigh radiation scattering. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.