The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2021

Filed:

Jul. 31, 2019
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Masahiko Konno, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/416 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32724 (2013.01); G05B 19/416 (2013.01); H01L 21/67167 (2013.01); H01L 21/67253 (2013.01); G05B 2219/37371 (2013.01); H01J 2237/002 (2013.01);
Abstract

A substrate processing apparatus configured to perform a preset processing on a substrate includes a pipe through which a liquid flows; a liquid leakage collector configured to receive the liquid leaking from the pipe; a first detector provided within the liquid leakage collector, and configured to detect the liquid; a second detector provided at a position higher than the first detector within the liquid leakage collector, and configured to detect the liquid; an indicator configured to notify liquid leakage information indicating a liquid leakage; a power supply configured to perform a power feed to the substrate processing apparatus; and a controller configured to control the indicator to notify the liquid leakage information based on a detection result of the first detector, and control the power supply to stop the power feed to the substrate processing apparatus based on a detection result of the second detector.


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