The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2021
Filed:
Sep. 01, 2020
Ansys, Inc., Canonsburg, PA (US);
Sandeep Menon, Chicago, IL (US);
Thomas Gessner, Grantham, NH (US);
Ansys, Inc., Canonsburg, PA (US);
Abstract
Systems and methods are provided for the refining and coarsening of a polyhedra mesh. The refinement includes identifying a plurality of polyhedral cells within a polyhedra mesh. A plurality of parent faces having a plurality of parent face edges are extracted for each polyhedral cell within the polyhedra mesh. For each parent face, a plurality of nodes are defined and connected either isotropically or anisotropically. A plurality of non-overlapping child faces are generated with a perimeter defined by a combination of parent face edges and child face edges. A plurality of child cells are generated from the connection of child faces of the plurality of non-overlapping child faces. Subsequent coarsening of the plurality of child cells occurs by the simultaneous agglomeration into each respective parent cell.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile