The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2021
Filed:
Jan. 31, 2020
Applicant:
Newport Corporation, Irvine, CA (US);
Inventors:
James Kafka, Palo Alto, CA (US);
Ching-Yuan Chien, Santa Clara, CA (US);
Andrei Florean, Menlo Park, CA (US);
Travis Petersen, San Jose, CA (US);
Alan Petersen, Palo Alto, CA (US);
Assignee:
MKS INSTRUMENTS, INC., Andover, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/10 (2006.01); H01S 3/11 (2006.01); H01S 3/106 (2006.01); H01S 3/105 (2006.01); H01S 3/102 (2006.01); H01S 3/30 (2006.01); H01S 3/00 (2006.01); G01N 21/25 (2006.01);
U.S. Cl.
CPC ...
H01S 3/1103 (2013.01); H01S 3/105 (2013.01); H01S 3/1024 (2013.01); H01S 3/1066 (2013.01); H01S 3/1068 (2013.01); H01S 3/11 (2013.01); H01S 3/1106 (2013.01); G01N 21/255 (2013.01); H01S 3/0092 (2013.01); H01S 3/302 (2013.01);
Abstract
The present application discloses a cavity dumped low repetition rate infrared tunable femtosecond laser source configured to produce pulses of 200 femtoseconds or less with a peak power of four megawatts or more for use in a variety of applications including multi-photon microscopy.