The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2021
Filed:
Mar. 29, 2018
Hitachi High-tech Corporation, Tokyo, JP;
Japan Fine Ceramics Center, Nagoya, JP;
Shunichi Motomura, Tokyo, JP;
Tsunenori Nomaguchi, Tokyo, JP;
Tadahiro Kawasaki, Nagoya, JP;
Takeharu Kato, Nagoya, JP;
Ryuji Yoshida, Nagoya, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Japan Fine Ceramics Center, Nagoya, JP;
Abstract
When using a charged particle beam aperture having a ring shape in a charged particle beam device, the charged particle beam with the highest current density immediately above the optical axis, among the charged particle beams is blocked, so that it is difficult to dispose the charged particle beam aperture at the optimal mounting position. Therefore, in addition to the ring-shaped charged particle beam aperture, a hole-shaped charged particle beam aperture is provided, and it is possible to switch between the case where the ring-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam and the case where the hole-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam.