The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2021
Filed:
Oct. 08, 2020
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Frank Treubel, Essingen, DE;
Christoph Fetzer, Neu-Ulm, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 5/08 (2006.01); G02B 7/182 (2021.01);
U.S. Cl.
CPC ...
G03F 7/70825 (2013.01); G02B 5/0891 (2013.01); G02B 7/1827 (2013.01); G03F 7/7085 (2013.01); G03F 7/70166 (2013.01); G03F 7/70258 (2013.01);
Abstract
A method for localizing an abnormality in a travel path of an optical component in or for a lithography apparatus includes: a) moving the optical component in at least one first degree of freedom; b) detecting a movement (R) of the optical component and/or a force acting on the optical component in at least one second degree of freedom; and c) localizing the abnormality as a function of the movement detected in b) and/or the force detected in b).
Quick Actions:
Treubel, Frank. (2021). Method, measuring system and lithography apparatus (U.S. Patent No. 11163239). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11163239
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile