The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2021
Filed:
Oct. 16, 2018
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C07C 303/32 (2006.01); C07C 309/06 (2006.01); C07C 309/07 (2006.01); C07C 309/09 (2006.01); C07C 309/12 (2006.01); C07C 309/24 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 303/32 (2013.01); C07C 309/06 (2013.01); C07C 309/07 (2013.01); C07C 309/09 (2013.01); C07C 309/12 (2013.01); C07C 309/24 (2013.01); G03F 7/0046 (2013.01); G03F 7/0048 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/38 (2013.01); G03F 7/70625 (2013.01);
Abstract
A resist composition comprising a base resin comprising recurring units having an acid labile group, and a metal salt of sulfonic acid exhibits a high sensitivity and high resolution, and forms a pattern of satisfactory profile with minimal LWR or improved CDU when processed by lithography.