The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2021
Filed:
Dec. 23, 2019
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
Wei-Hsiang Tseng, Hsinchu, TW;
Chin-Hsiang Lin, Hsinchu, TW;
Heng-Hsin Liu, New Taipei, TW;
Jui-Chun Peng, Hsinchu, TW;
Ho-Ping Chen, Jhubei, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); H01L 23/544 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G01B 11/02 (2013.01); G03F 9/7011 (2013.01); G03F 9/7084 (2013.01); H01L 23/544 (2013.01); H01L 2924/0002 (2013.01);
Abstract
A wafer alignment apparatus includes a light source, a light detection device, and a rotation device configured to rotate a wafer. The light source is configured to provide a light directed to the wafer. The light detection device is configured to detect reflected light intensity from the wafer to locate at least one wafer alignment mark of wafer alignment marks separated by a plurality of angles. At least two of those angles are equal.