The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 2021

Filed:

Jun. 19, 2019
Applicant:

Microchip Technology Inc., Chandler, AZ (US);

Inventors:

Amaury Gendron-Hansen, Bend, OR (US);

Dumitru Sdrulla, Bend, OR (US);

Assignee:

Microchip Technology Inc., Chandler, AZ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/40 (2006.01); H01L 21/761 (2006.01); H01L 29/16 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0619 (2013.01); H01L 21/761 (2013.01); H01L 29/1608 (2013.01); H01L 29/407 (2013.01); H01L 29/66712 (2013.01); H01L 29/7811 (2013.01);
Abstract

A high-voltage termination for a semiconductor device includes a substrate of a first conductivity type, an implanted device region of a second conductivity type of the semiconductor device, a shallow trench disposed in the substrate adjacent to the implanted device region, a doped extension region of the second conductivity type extending between the implanted device region and a first edge of the shallow trench adjacent to the implanted device region, a junction termination extension region of the second conductivity type formed in the shallow trench contacting the extension region and extending past a second edge of the shallow trench opposite the implanted device region, an insulating layer formed over at least a portion of the extension region and over the junction termination extension region, and a metal layer formed over the insulating layer extending into at least a portion of the shallow trench and electrically connected to the extension region.


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