The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2021
Filed:
Mar. 29, 2019
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Clifford Russell Bugge, Portland, OR (US);
Craig Henry, Hillsboro, OR (US);
Michael B. Schmidt, Gresham, OR (US);
Mark Najarian, Beaverton, OR (US);
Assignee:
FEI Company, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/305 (2006.01); H01J 37/20 (2006.01); H01J 37/147 (2006.01); H01J 37/28 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3056 (2013.01); H01J 37/1478 (2013.01); H01J 37/20 (2013.01); H01J 37/28 (2013.01); H01L 21/67288 (2013.01); H01J 2237/31745 (2013.01);
Abstract
Ion beams are directed to a substrate surface to expose a tapered, tilted surface in the substrate. The ion beams and the substrate are situated so that a first ion beam is incident along a first axis at a glancing angle, and a second ion beam is incident along a second axis in a plane defined by the glancing angle and at an angle with respect to the first axis. Exposure to the second ion beam tends to produced superior quality in the exposed surface such as by reducing curtain artifacts.