The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2021
Filed:
Aug. 14, 2020
Applicant:
Carl Zeiss Multisem Gmbh, Oberkochen, DE;
Inventors:
Dirk Zeidler, Oberkochen, DE;
Stefan Schubert, Oberkochen, DE;
Assignee:
Carl Zeiss MultiSEM GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/09 (2006.01); H01J 37/05 (2006.01); H01J 37/10 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/09 (2013.01); H01J 37/05 (2013.01); H01J 37/10 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/0492 (2013.01); H01J 2237/057 (2013.01); H01J 2237/24475 (2013.01);
Abstract
A multi-beam particle microscope includes a multi-beam particle source, an objective lens, a detector arrangement, and a multi-aperture plate with a multiplicity of openings. The multi-aperture plate is between the objective lens and the object plane. The multi-aperture plate includes a multiplicity of converters which convert backscattered electrons which are generated by primary particle beams at an object into electrons with a lower energy, which provide electrons that form electron beams detected by the detector arrangement.