The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 2021

Filed:

Jun. 26, 2019
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Rastislav Lukac, San Jose, CA (US);

Ravi Basavaraj, Sunnyvale, CA (US);

Gazi Naser Ali, Sunnyvale, CA (US);

Krishna Kumar Madaparambil, San Jose, CA (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/36 (2006.01); G06T 7/12 (2017.01); H04N 5/232 (2006.01); G06T 3/40 (2006.01);
U.S. Cl.
CPC ...
G06T 7/12 (2017.01); G06T 3/4038 (2013.01); H04N 5/23238 (2013.01); G06T 2207/20221 (2013.01);
Abstract

An apparatus comprising a memory to store a first image captured by a first camera and a second image captured by a second camera; and a processor comprising circuitry, the processor to identify viewpoint information defining a view for a stitched image, the stitched image to be generated from a combination of a plurality of images comprising the first image and the second image; and based on the viewpoint information and a projection type, determine transformation parameters for at least one reference region associated with overlapping regions of the first image and the second image in order to: localize overlapping regions of the first image and the second image to determine stitching parameters; combine the first image and the second image using the stitching parameters; and assign data of the combined first image and the second image to the stitched image.


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