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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11152234 B1

PDFFull Text
Date of Patent:
Oct. 19, 2021

Filed:

Mar. 29, 2018

Weighing apparatus, substrate liquid processing apparatus, weighing method, substrate liquid processing method and recording medium

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Teruaki Konishi, Koshi, JP;

Kazusige Sano, Koshi, JP;

Koji Tanaka, Koshi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

Pearne & Gordon LLP

Primary Examiner:

Parviz Hassanzadeh

Assistant Examiner:

Margaret D Klunk

Int. Cl.
CPC ...
H01L 21/67 (2006.01); G01N 5/00 (2006.01); G01F 11/00 (2006.01); H01L 21/677 (2006.01); G01G 5/00 (2006.01); G01F 11/28 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67242 (2013.01); G01F 11/00 (2013.01); G01G 5/00 (2013.01); G01N 5/00 (2013.01); H01L 21/67028 (2013.01); H01L 21/67034 (2013.01); H01L 21/67057 (2013.01); H01L 21/67075 (2013.01); H01L 21/67086 (2013.01); H01L 21/67173 (2013.01); H01L 21/67253 (2013.01); H01L 21/67718 (2013.01); G01F 11/284 (2013.01); H01L 21/67017 (2013.01); H01L 21/67207 (2013.01);
Abstract

A processing liquid used in a substrate liquid processing apparatus can be supplied in a constant amount with high accuracy. A substrate liquid processing apparatus Aincludes a storage lineconfigured to store a processing liquid therein; an introduction lineconfigured to introduce the processing liquid into the storage line; a discharge lineconfigured to discharge the processing liquid from the storage line; and a gas supply unitconfigured to perform a strickling of the processing liquid by jetting a gas to a surface of the processing liquid stored in the storage line

Find Patent Forward Citations

Konishi, Teruaki. (2021). Weighing apparatus, substrate liquid processing apparatus, weighing method, substrate liquid processing method and recording medium (U.S. Patent No. 11152234). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11152234

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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