The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2021
Filed:
Jun. 17, 2020
Applicant:
Tsinghua University, Beijing, CN;
Inventors:
Songling Huang, Beijing, CN;
Wenzhi Wang, Beijing, CN;
Lisha Peng, Beijing, CN;
Wei Zhao, Beijing, CN;
Shen Wang, Beijing, CN;
Zijing Huang, Beijing, CN;
Assignee:
TSINGHUA UNIVERSITY, Beijing, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 33/00 (2006.01); G01R 33/038 (2006.01); H01F 7/02 (2006.01);
U.S. Cl.
CPC ...
G01R 33/0094 (2013.01); G01R 33/038 (2013.01); H01F 7/02 (2013.01);
Abstract
A device and a method for detecting a defect contour with omnidirectionally equal sensitivity based on magnetic excitation are provided. The device includes a magnetic sensor array arranged in a spatially uniform magnetic field and configured to collect a magnetic field signal, and a data analysis module configured to analyze the magnetic field signal, extract a distorted magnetic field signal, and obtain an image of the defect contour based on the distorted magnetic field signal.