The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Mar. 20, 2020
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Jean-Marc Bohlen, Ecublens, CH;

Cornelis van Beek, Pittsburgh, PA (US);

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/892 (2006.01); G01N 21/67 (2006.01); G01N 23/2252 (2018.01);
U.S. Cl.
CPC ...
G01N 21/892 (2013.01); G01N 21/67 (2013.01); G01N 23/2252 (2013.01); G01N 2021/8925 (2013.01);
Abstract

Various methods and systems are provided for analyzing sample inclusions. As one example, a correction factor may be generated based on inclusion properties of a first sample determined using both an optical emission spectrometry (OES) system and a charged-particle microscopy with energy dispersive X-ray spectroscopy (CPM/EDX) system. The OES system may be calibrated with the correction factor. The inclusion properties of a second, different, sample may be determined using the calibrated OES system.


Find Patent Forward Citations

Bohlen, Jean-Marc. (2021). Methods and systems for inclusion analysis (U.S. Patent No. 11150197). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11150197

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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