The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2021
Filed:
May. 04, 2016
Applicants:
Solvay SA, Brussels, BE;
Fraunhofer-gesellschaft Zur Förderung Der Angewandten Forschung E.v., Munich, DE;
Inventors:
Assignees:
Solvay SA, Brussels, BE;
FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEW ANDTEN FORSCHUNG E.V., Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); B08B 7/00 (2006.01); H01J 37/32 (2006.01); B08B 5/00 (2006.01); B08B 9/08 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); B08B 5/00 (2013.01); B08B 7/0035 (2013.01); B08B 9/08 (2013.01); H01J 37/32357 (2013.01); H01J 37/32862 (2013.01); H01J 2237/3321 (2013.01); H01L 21/31116 (2013.01);
Abstract
The present invention relates to a process for cleaning chambers of apparatus used for semiconductor manufacturing with a gas mixture comprising or consisting of fluorine, nitrogen and argon as well as said gas mixtures.