The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2021
Filed:
Jan. 13, 2016
Siltronic Ag, Munich, DE;
Vladimir Dutschke, Lengefeld, DE;
Torsten Olbrich, Dresden, DE;
Leszek Mistur, Burghausen, DE;
Markus Schnappauf, Zell am Moos, AT;
SILTRONIC AG, Munich, DE;
Abstract
A method dresses one polishing cloth or two polishing pads simultaneously, in which a polishing cloth has been applied to a polishing plate, with at least one dresser (), which is equipped with at least one dressing element (), this at least one dressing element () being in contact with the at least one polishing cloth () to be dressed, wherein the at least one polishing plate () is rotated with a relative rotational speed and the at least one dresser () is rotated with a relative rotational speed and at least two different combinations of directions of rotation of the two pairs of polishing plates () and pin wheels () are executed during the simultaneous dressing of two polishing pads () or during the dressing of one polishing cloth () of the polishing plate () and of the at least one dresser ().