The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 2021

Filed:

Nov. 05, 2019
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventor:

Wei-Chih Lin, Chiayi, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0696 (2013.01); H01L 29/0653 (2013.01); H01L 29/4238 (2013.01); H01L 29/66681 (2013.01); H01L 29/7816 (2013.01);
Abstract

The disclosure provides a semiconductor device having a separate active region and a method of fabricating the same. The semiconductor device includes a substrate, a plurality of isolation islands, a source region, and a drain region. The substrate includes a first active region, a second active region, and a plurality of separate active regions. The separate active regions are connected to the first active region and the second active region. The separate active regions and the isolation islands are alternately disposed. The gate structure includes a body portion and a plurality of extensions. The body portion disposed on a portion of the first active region. The extensions are coupled to the body portion and extend from the body portion to the isolation islands. The source region and the drain region are respectively located in the substrate in the first active region and the second active region.


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