The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 2021

Filed:

Mar. 18, 2021
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Takashi Yahata, Toyama, JP;

Naofumi Ohashi, Toyama, JP;

Ryuji Yamamoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/52 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01); C23C 16/46 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02274 (2013.01); C23C 16/46 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); H01J 37/32449 (2013.01); H01J 37/32715 (2013.01); H01J 37/32743 (2013.01); H01L 21/0214 (2013.01); H01L 21/0217 (2013.01); H01L 21/02167 (2013.01); H01L 21/67017 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/332 (2013.01);
Abstract

There is provided a technique that includes: (a) loading a substrate into a process container; (b) heating the substrate by supplying a first gas, which is heated when passing through a first heater installed at a first gas supply line, to the substrate via a gas supplier; (c) supplying a second gas, which flows through a second gas supply line different from the first gas supply line, to the substrate mounted on a substrate mounting table in the process container, via the gas supplier; and (d) lowering a temperature of the gas supplier by supplying a third gas, which has a temperature lower than that of the first gas, to the gas supplier between (b) and (c).


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